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2017/03/20 講者: Prof. Teruaki Hayakawa 講題: Creation of Block Copolymers for Nanofabrication Materials|專題演講

講者:Prof. Teruaki Hayakawa, Department of Materials Science and Engineering, Tokyo Institute of Technology

演講題目:Creation of Block Copolymers for Nanofabrication Materials

演講時間:3/20() 10:00 AM

演講地點:223會議室

主持人:戴子安教授

 

Creation of Block Copolymers for Nanofabrication Materials


 

Teruaki Hayakawa


Department of Materials Science and Engineering,


Tokyo Institute of Technology, Tokyo, Japan


 

Abstract: In this talk, a new design of block copolymers targeted for sub-10 nm features in the next generation lithography materials, which are able to form perpendicularly oriented lamellar structures in thin films, will be described. A wide range structural control from primary structure, higher-order structure, to its orientation is essential. The orientation can be completed in only one minute at 90-130 °C in an air atmosphere. Oxygen plasma etching for the thin films results in the achievement of a line width of 8 nm. Furthermore, a long range ordering of the microphase-separated structures by the directed self-assembly (DSA) will be shown.

 

Short Biography:

Teruaki Hayakawa received his B.S. (1995), M.S. (1997) and Ph.D. (2000) from Yamagata University with Prof. Mitsuru Ueda for research in the fields of materials science and engineering. During 1997-1998 he was a visiting student with Prof. Christopher K. Ober at Cornell University. In 2000 he joined the National Institute of Advanced Industrial Science and Technology (AIST) as a researcher and moved to Tokyo Institute of Technology in 2003. He is currently an Associate Professor in the Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology. He was a chairperson of the research group on Polymers for Microelectronics and Photonics, the Society of Polymer Science, Japan (SPSJ) in 2012-2014. He has received the Award of Encouragement of Research in Polymer Science National Science, SPSJ 2005, SPSJ Award for the Outstanding Paper in Polymer Journal 2006 sponsored by ZEON, SPSJ Hitachi Chemical Award 2010, SPSJ Wiley Award 2015, and The Photopolymer Science and Technology Award, The Best Paper Award 2016.

 

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